Inverse lithography technology principles in practice: Unintuitive patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Liu, Yong ^a   Abrams, Dan ^a   Pang, Linyong ^a   Moore, Andrew ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

Inverse Lithography Technology (ILT); Lithography; OPC; RET

Indexed keywords

INVERSE LITHOGRAPHY TECHNOLOGY (ILT); OPC; RET;

MASKS; OPTICAL ENGINEERING;

PHOTOLITHOGRAPHY;

EID: 33644596206     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632366     Document Type: Conference Paper

References (8)

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