The influence of Au-doping on morphology and visible-light reflectivity of TiN thin films deposited by direct-current reactive magnetron sputtering

Chinese Physics Letters

Volumn 27, Issue 5, 2010, Pages

  Na, Yuan Yuan ^a   Wang, Cong ^a   Liu, Yu ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; FILM GROWTH; GOLD; GOLD DEPOSITS; LIGHT; MAGNETRON SPUTTERING; MORPHOLOGY; REFLECTION; SEMICONDUCTOR DOPING; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THIN FILMS; TIN; TITANIUM DIOXIDE; TITANIUM NITRIDE;

CRYSTALS STRUCTURES; DC REACTIVE MAGNETRON SPUTTERING; DIRECT-CURRENT; LIGHT REFLECTIVITY; REACTIVE MAGNETRON SPUTTERING; STAINLESS STEEL SUBSTRATES; THIN-FILMS; TIN FILMS; TIN THIN FILMS; VISIBLE LIGHT;

METALLIC FILMS;

EID: 77951967580     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/27/5/056802     Document Type: Article

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