Structures and properties of Zr-N films prepared by ECR-microwave plasma source enhanced direct-current magnetron sputtering under different N 2 partial pressures

Chinese Physics Letters

Volumn 21, Issue 10, 2004, Pages 2008-2011

  Liu, Tian Wei ^a,b   Deng, Xin Lu ^a   Wang, Xiao Yin ^b   Wang, Ying Min ^a   Zou, Jian Xin ^a   Dong, Chuang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; MAGNETRON SPUTTERING; MICROWAVES; PARTIAL PRESSURE; THIN FILMS;

45 STEEL; AMORPHOUS PHASIS; D.C. MAGNETRON SPUTTERING; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; DIRECT-CURRENT MAGNETRON SPUTTERING; ECR MICROWAVE; MICROWAVE PLASMA SOURCES; STRUCTURES AND PROPERTIES; THIN-FILMS;

FILM PREPARATION;

EID: 6344254493     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/21/10/040     Document Type: Article

References (12)

1. Feuske G 1986 Vac. Sci. Technol, A 4 2879
2. Reiners G 1994 Thin Solid Films 253 33
3. Panjian P et al 1996 Thin Solid Films 281/282 298
4. Wen J Ch et al 2002 Thin Solid Films 40 51
5. Xinlv Deng et al 2001 Solid Films 390 107
6. Xin Li et al 2003 Chin. Phys. Lett. 20 692
7. Jehn H A et al 1988 Surf. Coat. Technol. 36 715
8. Pichon L et al 1999 Appl. Surf. Sci. 150 115
9. Jin S et al 1993 J. Appl. Phys. 74 2886
10. Nose N et al 2001 Surf. Coat. Technol. 142-144 211
11. Enlsinger W et al 1993 Nucl. Instrum. Methods Phys. Res. B 80 445
12. Kelesoglu E et al 1999 Surf. Coat. Technol. 112 108