Study of the effect of plasma current density on the formation of titanium nitride and titanium oxynitride thin films prepared by reactive DC magnetron sputtering

Vacuum

Volumn 84, Issue 7, 2010, Pages 896-901

  Barhai, P K ^a   Kumari, Neelam ^a   Banerjee, I ^a   Pabi, S K ^b   Mahapatra, S K ^a  

^a BIRLA INSTITUTE OF TECHNOLOGY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Plasma current density; Thin film; Titanium oxynitride

Indexed keywords

COLOR; COLORIMETRIC ANALYSIS; COLORIMETRY; CRYSTAL ORIENTATION; CURRENT DENSITY; FLOW OF GASES; HARDNESS; MAGNETRON SPUTTERING; OXYGEN; TITANIUM NITRIDE; X RAY DIFFRACTION;

DC MAGNETRON SPUTTERING; GRAZING INCIDENCE X-RAY DIFFRACTION; OXYGEN INCORPORATION; PLASMA CURRENTS; REACTIVE DC MAGNETRON SPUTTERING; THICKNESS OF THE FILM; TITANIUM NITRIDE FILMS; TITANIUM OXYNITRIDE;

THIN FILMS;

EID: 76849086385     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.12.004     Document Type: Article

References (28)

1. Al-Jaroudi M.Y., Hentezell H.T.G., Homstrom S.E., and Bengstom A. Thin Solid Films 190 (1990) 265
2. Valvoda V., Kuzel R., Cerany R., and Musil J. Thin Solid Films 156 (1988) 53
3. Kim N.Y., Son Y.B., Oh J.H., Hwangbo C.K., and Park M.C. Surf Coat Technol 128-129 (2000) 156
4. Mitter C., Komenda J., Losbichler P., Schmölz P., Werner W.S.M., and Störi H. Vacuum 46 (1995) 1281
5. Zega B., Kornmann M., and Amiguet J. Thin Solid Films 45 (1977) 577
6. Vaz F., Cerqueira P., Nascimenqu S.M.C., Alves E., Goudeau P., and Riviere J.P. Surf Coat Technol 174-175 (2003) 197
7. Nose M., Nagae T., Yokota M., Saji S., Zhou M., and Nakada M. Surf Coat Technol 116-119 (1999) 296
8. Kumar N., Mc Ginn J.T., Pourrezaei K., Lee B., and Douglas E.C. J Vac Sci Technol A 6 (1988) 1602
9. Wittmer M., Noser J., and Melchior H. J Appl Phys 52 (1981) 6659
10. Nicolet M.A., and Bartur M. J.Vac Sci Technol 19 (1981) 786
11. Jayachandran Y.L., Narayandass Sa.K., Mangalaraj D., Areva S., and Mielczarski J.A. Mat Sc Eng A 445-446 (2007) 223
12. Barshilia H.C., and Rajam K.S. Bull Mater Sci 27 (2004) 35
13. Braic M., Balaceanu M., Vladescu A., Kiss A., Braic V., Epurescu G., et al. Appl Surf Sci 253 (2007) 8210
14. Kim K.H., and Lee S.H. Thin Solid Films 283 (1996) 165
15. Massissel L.I., and Glang R. Handbook of thin solid films technology (1970), McGraw-Hill Book Company, New York
16. Sinha M.K., Mukherjee S.K., Pathak P., Paul R.K., and Barhai P.K. Thin Solid Films 515 (2006) 1753
17. Uhlir A. Bell Syst Tech J 34 (1955) 105
18. Lu K., and Zhao Y.H. Nano Structured Materials 12 (1999) 559
19. Yokota K., Nakamura K., Kasuya T., Tamura S., Sugimoto T., Akamatsu K., et al. J Mater Sci 38 (2003) 2011
20. Kubaschewski O., and Alcock C.B. Metallurgical thermochemistry (1979), Pergamon Oxford [Tables]
21. Vaz F., Cerqueira P., Rebouta L., Naascimento S.M.C., Alves E., Goudeau P., et al. Thin Solid Films 447-448 (2004) 449
22. Chappe J.M., Martin N., Lintymer J., Sthal F., Terwagne G., and Takdown J. Appl Surf Sci 253 (2007) 5312
23. Chou W.J., Yu G.P., and Huang J.H. Surf Coat Technol 149 (2002) 7
24. Chappe J.M., Martin N., Terwagne G., Lintymer J., Gavoille J., and Takdown J. Thin Solid Films 440 (2003) 66
25. Kanamori S. Thin Solid Films 136 (1986) 195
26. Ohring M. Engineering materials science (1995), Academic Press. 0125249950
27. Martin N., Sanjines R., Takadoum J., and Levy F. Surf Coat Technol 142-144 (2001) 615
28. Lu C.J., Zhang J., and Li Z.Q. J Alloys Compd 381 (2004) 278