Deposition of TiN films by novel filter cathodic arc technique

Chinese Physics Letters

Volumn 23, Issue 6, 2006, Pages 1533-1535

  Niu, Er Wu ^a   Fan, Song Hua ^a   Li, Li ^a   Lü, Guo Hua ^a   Feng, Wen Ran ^a   Zhang, Gu Ling ^a   Yang, Si Ze ^a  

^a INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; ION BEAM ASSISTED DEPOSITION; ION BEAMS; ION BOMBARDMENT; NITROGEN; THIN FILMS; TIN; TITANIUM NITRIDE;

CATHODIC ARC TECHNIQUE; DEPOSITION PROCESS; FILM STOICHIOMETRY; HEATED SUBSTRATES; IONS BOMBARDMENT; NITROGEN ATMOSPHERES; NITROGEN IONS; PROPERTY; THIN-FILMS; TIN FILMS;

METALLIC FILMS;

EID: 33746729801     PISSN: 0256307X     EISSN: 17413540     Source Type: Journal    
DOI: 10.1088/0256-307X/23/6/049     Document Type: Article

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