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Volumn 204, Issue 6-7, 2009, Pages 923-926

Sub-microstructure and surface topography of reactive unbalanced magnetron sputtered titanium and titanium compound thin films

Author keywords

Reactive sputtering; TEM; TiN

Indexed keywords

CLOSE PACKED; CLOSE PROXIMITY; CRYSTAL DIRECTION; CRYSTALLOGRAPHIC TEXTURES; CYLINDRICAL SUBSTRATE; DC MODE; DENSE COLUMNAR STRUCTURES; DEPOSITION CONDITIONS; ENERGETIC PARTICLES; FILM COMPOSITION; GROWTH DIRECTIONS; NITROGEN FLOW RATES; NON-EQUILIBRIUM MICROSTRUCTURE; NON-EQUILIBRIUM PROCESS; PHYSICAL VAPOUR DEPOSITION; POWER SUPPLY; PULSE FREQUENCIES; SUBSTRATE SURFACE; TEM; TITANIUM CATHODE; TITANIUM METALS; UNBALANCED MAGNETRON;

EID: 71849113780     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.07.003     Document Type: Article
Times cited : (5)

References (15)
  • 4
    • 0003651233 scopus 로고    scopus 로고
    • Brandes, and Brook G.B. (Eds), Butterworth Heinmann, Oxford
    • In: Brandes, and Brook G.B. (Eds). Smithells Light Metals Handbook (1998), Butterworth Heinmann, Oxford
    • (1998) Smithells Light Metals Handbook


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.