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Volumn 204, Issue 6-7, 2009, Pages 923-926
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Sub-microstructure and surface topography of reactive unbalanced magnetron sputtered titanium and titanium compound thin films
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Author keywords
Reactive sputtering; TEM; TiN
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Indexed keywords
CLOSE PACKED;
CLOSE PROXIMITY;
CRYSTAL DIRECTION;
CRYSTALLOGRAPHIC TEXTURES;
CYLINDRICAL SUBSTRATE;
DC MODE;
DENSE COLUMNAR STRUCTURES;
DEPOSITION CONDITIONS;
ENERGETIC PARTICLES;
FILM COMPOSITION;
GROWTH DIRECTIONS;
NITROGEN FLOW RATES;
NON-EQUILIBRIUM MICROSTRUCTURE;
NON-EQUILIBRIUM PROCESS;
PHYSICAL VAPOUR DEPOSITION;
POWER SUPPLY;
PULSE FREQUENCIES;
SUBSTRATE SURFACE;
TEM;
TITANIUM CATHODE;
TITANIUM METALS;
UNBALANCED MAGNETRON;
CRYSTALLITES;
MICROSTRUCTURE;
SINGLE CRYSTALS;
SUBSTRATES;
SURFACE TOPOGRAPHY;
THIN FILMS;
TITANIUM;
TITANIUM NITRIDE;
TOPOGRAPHY;
TRANSITION METAL COMPOUNDS;
FILM GROWTH;
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EID: 71849113780
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2009.07.003 Document Type: Article |
Times cited : (5)
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References (15)
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