Laser-driven high-resolution patterning of indium tin oxide thin film for electronic device

Optics and Lasers in Engineering

Volumn 48, Issue 7-8, 2010, Pages 816-820

  Shin, Hyunkwon ^a   Sim, Boyeon ^a   Lee, Myeongkyu ^a  

^a Yonsei University   (South Korea)

Author keywords

Indium tin oxide; Laser; Patterning

Indexed keywords

CHANNEL AREA; CHEMICAL ETCHING; ELASTIC FORCE; ELECTRONIC DEVICE; HIGH FIDELITY; HIGH RESOLUTION; HIGH-RESOLUTION PATTERNING; INDIUM TIN OXIDE; INDIUM TIN OXIDE THIN FILMS; ITO ELECTRODES; LASER INDUCED; LASER PATTERNING; LOW TEMPERATURES; METAL FILM; METAL LAYER; OFF-CURRENT; PENTACENE THIN FILM TRANSISTORS; PLASTIC AND GLASS SUBSTRATES; PULSED ND:YAG LASER; RELEASE LAYER; SOURCE AND DRAIN ELECTRODES; TRANSPARENT SUBSTRATE; TRANSPARENT THIN FILM;

DRAIN CURRENT; ELECTRODES; GLASS LASERS; INDIUM; ITO GLASS; PHOTOLITHOGRAPHY; PULSED LASER APPLICATIONS; PULSED LASERS; SUBSTRATES; THIN FILM TRANSISTORS; THIN FILMS; TIN; TITANIUM COMPOUNDS;

NEODYMIUM LASERS;

EID: 77951253282     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlaseng.2010.02.008     Document Type: Article

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