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Volumn 20, Issue 24, 2009, Pages

Parallelized laser-direct patterning of nanocrystalline metal thin films by use of a pulsed laser-induced thermo-elastic force

Author keywords

[No Author keywords available]

Indexed keywords

1064 NM; BLOCK MODELS; DEPOSITED METAL; DIRECT-PATTERNING; ELASTIC FORCE; FILM PATTERNING; GRAIN BOUNDARY REGIONS; HIGH FIDELITY; LOCALIZED ETCHING; METAL THIN FILM; MICROMETER SCALE; NANOCRYSTALLINE METAL; NANOCRYSTALLINE THIN FILMS; NANOSIZED GRAINS; ND-YAG LASERS; PATTERNING PROCESS; PHOTORESIST LAYERS; PHOTORESIST-FREE; POLYCRYSTALLINE; PULSE ENERGIES; PULSE WIDTH; PULSED LASER; SIMULATION MODEL; SINGLE PULSE; TRANSPARENT SUBSTRATE;

EID: 67649204073     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/24/245301     Document Type: Article
Times cited : (22)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.