Photoresist-free lithographic patterning of solution-processed nanostructured metal thin films

Advanced Materials

Volumn 20, Issue 18, 2008, Pages 3457-3461

  Shin, Hyunkwon ^a   Kim, Hyunjun ^a   Lee, Hyeongjae ^a   Yoo, Hyeonggeun ^a   Kim, Jinsoo ^a   Kim, Hyoungsub ^b   Lee, Myeongkyu ^a  

^a Yonsei University   (South Korea)

^b Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DESORPTION; LASER BEAMS; LASERS; LITHOGRAPHY; MODULATION; NANOSTRUCTURED MATERIALS; PHOTORESISTORS; PHOTORESISTS; PULSED LASER APPLICATIONS; SOLIDS; SURFACE TREATMENT; THICK FILMS; THIN FILMS;

CONVENTIONAL LITHOGRAPHIES; FILM/SUBSTRATE INTERFACES; METAL THIN FILMS; MODULATED LASERS; NANOSTRUCTURED FILMS; NANOSTRUCTURED METALS; ND: YAG; OPTICAL MODULATIONS; PATTERNING; PHOTORESIST LAYERS; PULSED LASERS; SILVER THIN FILMS; TRANSPARENT SUBSTRATES; VACUUM PROCESSES;

SILVER;

EID: 54949138813     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200800157     Document Type: Article

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