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Neither evaporator is equipped with a substrate temperature monitor or means to control the substrate temperature during deposition. Thus, the actual temperature during deposition is unknown. A higher deposition temperature is expected for substrates prepared by method one since the platen that holds the substrates in the evaporator is closer to the silver source compared to the evaporator used for preparing substrates by method two
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Neither evaporator is equipped with a substrate temperature monitor or means to control the substrate temperature during deposition. Thus, the actual temperature during deposition is unknown. A higher deposition temperature is expected for substrates prepared by method one since the platen that holds the substrates in the evaporator is closer to the silver source compared to the evaporator used for preparing substrates by method two.
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