Coarsening mechanisms in a metal film: From cluster diffusion to vacancy ripening

Physical Review Letters

Volumn 76, Issue 4, 1996, Pages 652-655

  Wen, J M ^a   Evans, J W ^a   Bartelt, M C ^a   Burnett, J W ^a   Thiel, P A ^a  

^a IOWA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 3843104460     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.76.652     Document Type: Article

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