Vibrational spectroscopy characterization of magnetron sputtered silicon oxide and silicon oxynitride films

Applied Surface Science

Volumn 256, Issue 1, 2009, Pages 156-164

  Godinho, V ^a,b   Denisov, V N ^c   Mavrin, B N ^c   Novikova, N N ^c   Vinogradov, E A ^c   Yakovlev, V A ^c   Fernandez Ramos C ^a,d   de Haro, M C Jiménez ^a   Fernandez A ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSITÉ LIBRE DE BRUXELLES   (Belgium)

^c INSTITUTE OF SPECTROSCOPY   (Russian Federation)

^d JOINT RESEARCH CENTRE   (Italy)

Author keywords

Infrared; Magnetron sputtering; Raman; Silicon oxide; Silicon oxynitride; Vibrational spectroscopy

Indexed keywords

COATINGS; FILM PREPARATION; INFRARED RADIATION; MAGNETRON SPUTTERING; NANOCRYSTALS; NITRIDES; OXIDE FILMS; PHOTONS; REFLECTION; SCANNING ELECTRON MICROSCOPY; SILICON ALLOYS; SILICON NITRIDE; SILICON OXIDES; VIBRATIONAL SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATTENUATED TOTAL REFLECTION FOURIER TRANSFORM INFRARED; DIELECTRIC FUNCTIONS; INFRARED AND RAMAN SPECTRA; INFRARED REFLECTIVITY MEASUREMENT; RAMAN; REFLECTIVITY SPECTRA; SILICON OXYNITRIDE FILMS; SILICON OXYNITRIDES;

SILICON COMPOUNDS;

EID: 70349772930     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.07.101     Document Type: Article

References (31)

1. Eriksson T.S., and Granqvist C.G. Infrared optical properties of silicon oxynitride films: experimental data and theoretical interpretation. J. Appl. Phys. 60 (1986) 2081-2091
2. Ribeiro M., Pereyra I., and Alayo M.I. Silicon rich oxynitride films for photoluminescence applications. Thin Solid Films 426 (2003) 200-204
3. Criado D., Alayo M.I., Fantini M.C.A., and Pereyra I. Study of the mechanical and structural properties of silicon oxynitride for optical applications. J. Non-Cryst. Sol. 35 (2006) 2319-2323
4. M. Arbad, P.A. Medwick, L.A. Miller, G.J. Marietti, Silicon oxynitride protective coatings, Patent: WO/1998/058885.
5. Samano E.C., Camacho J., and Machorro R. Optimal control on composition and optical properties of silicon oxynitride thin films. J. Vac. Sci. Technol. A 23 (2005) 1228-1233
6. Tan X., Wojcik J., Mascher P., and Mascher P. Study of the optical properties of SiOxNy thin films by effective medium theories. J. Vac. Sci. Technol. A 22 (2004) 1115-1119
7. Tsu D.V., Lucovsky G., and Mantini M.J. Deposition of silicon oxynitride thin films by remote plasma enhanced chemical vapor deposition. J. Vac. Sci. Technol. A 5 (1987) 1998-2002
8. Barnes W.L., Dereux A., and Eddesen T.W. Surface Plasmon subwavelength optics. Nature 424 (2003) 824-830
9. W. Theiß, The SCOUT through CHAOS, Manual of the Windows application SCOUT, Hard and Software for optical spectroscopy, Aachen (Germany) 1998.
10. Krüger M., Hilbrich S., Thönissen M., Scheyen D., Theiß W., and Lüth H. Suppression of ageing effects in porous silicon interference filters. Opt. Commun. 146 (1998) 309-315
11. Zhizhin G.N., Moskaleva M.A., Vinogradov E.A., and Yakovlev V.A. Application of surface polaritons for vibrational spectroscopic studies of thin and very thin films. Appl. Spectrom. Rev. 18 2 (1982-1983) 171-263
12. Vinogradov E.A., Zhizhin G.N., and Yakolev V.A. Resonance between dipole oscillations of atoms and interference modes in crystalline films. Sov. Phys. JETP 50 3 (1979) 486-490
13. x films fabricated by pulsed reactive closed-field unbalanced magnetron sputtering. Nucl. Instrum. Methods Phys. Res. B 240 (2005) 741-751
14. Vila M., Prieto C., García-López J., and Respaldiza M.A. Influence of the target and working gas on the composition of silicon nitride films prepared by reactive RF-sputtering. Nucl. Instrum. Methods Phys. Res. B 211 (2003) 199-205
15. Oliveira A., Cavaleiro A., and Vieira M.T. Production and characterization of Si-N films obtained by r.f. magnetron sputtering. Surf. Coat. Technol. 60 (1993) 463-467
16. Briggs D., and Seah M.P. Practical Surface Analysis. Auger and X-ray Photoelectron Spectroscopy. 2nd ed. vol. 1 (1990), John Wiley and Sons Ltd.
17. Kim J.H., and Chung K.W. Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering. Journal of Applied Physics 83 11 (1998) 5831-5839
18. Ohwaki T., and Taga Y. Enhancement of deposition rates in the reactive sputtering of silicon exposed to an argon-oxygen plasma. Appl. Phys. Lett. 59 4 (1991) 420-422
19. Thornton J.A. Ann. Rev. Mater. Sci. 7 (1977) 239-260
20. Vinogradov E.A. Vibrational polaritons in semiconductor films on metal surfaces. Phys. Rep. 217 4 (1992) 159-223
21. Knolle W.R., and Allara D.L. Infrared spectroscopic characterization of silicon nitride films-optical dispersion induced frequency shifts. Appl. Spectrosc. 40 7 (1986) 1046-1049
22. Fernández-Ramos C., Sánchez-López J.C., Belin M., Donnet C., Ponsonnet L., and Fernández A. Tribological behaviour and chemical characterisation of Si-free and Si-containing carbon nitride coatings. Diamond Relat. Mater. 11 2 (2002) 169-175
23. Machorro R., Samano E.C., Soto G., Villa F., and Cota-Araiza L. Modification of refraction index in silicon oxynitride films during deposition. Mater. Lett. 45 (2000) 47-50
24. y thin films on their optical properties. Opt. Mater. 31 3 (2009) 510-513
25. Bruggeman D.A.G. Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen Substanzen. Annalen der Physik 416 8 (1935) 665-679
26. Wang Y., Yue R., Han H., and Liao X. Raman study of structural order of a-SiNx:H and its change upon thermal annealing. J. Non-Cryst. Solids 291 1-2 (2001) 107-112
27. 4 . Phys. Rev. Lett. 83 (1999) 5046-5049
28. Aguilar H., Serra J., González P., and León B. Structural study of sol-gel silicate glasses by IR and Raman spectroscopies. J. Non-Cryst. Solids 355 (2009) 475-480
29. Brawer S.A. Theory of the vibrational spectra of some network and molecular glasses. Phys. Rev. B 11 (1975) 3173-3194
30. x thin films prepared by co-evaporation of Si and SiO. Materials Science and Engineering B 69-70 (2000) 484-488
31. Lakhtakia A. General schema for the Brewster conditions. Optik 90 (1992) 184-186