Evaporation-induced self-assembly: Nanostructures made easy

Advanced Materials

Volumn 11, Issue 7, 1999, Pages 579-585

  Brinker, C Jeffrey ^a,c   Lu, Yunfeng ^a   Sellinger, Alan ^b   Fan, Hongyou ^c  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b Canon Research Center America   (United States)

^c UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL MICELLE CONCENTRATION; ELECTROSTATICS; EVAPORATION; HYDROGEN BONDS; HYDROPHOBICITY; MOLECULAR STRUCTURE; POLYMERS; POROUS MATERIALS; SURFACE ACTIVE AGENTS; VAN DER WAALS FORCES;

EVAPORATION-INDUCED SELF-ASSEMBLY (EISA);

NANOSTRUCTURED MATERIALS;

EID: 0032628671     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(199905)11:7<579::AID-ADMA579>3.0.CO;2-R     Document Type: Article

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