High rate deposition of ZnO thin films by a small-scale inductively coupled argon plasma generated in open air

Journal of Physics D: Applied Physics

Volumn 43, Issue 15, 2010, Pages

  Stauss, S ^a   Imanishi, Y ^a   Miyazoe, H ^a   Terashima, K ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PLASMAS; HIGH GROWTH RATE; HIGH SUBSTRATE TEMPERATURE; HIGH-RATE DEPOSITION; INDUCTIVELY-COUPLED; OPTICAL TRANSMISSIONS; PLASMA GAS; PLASMA GAS TEMPERATURE; ROTATIONAL TEMPERATURE; SCANNING RATE; SUBSTRATE SURFACE; SUBSTRATE TEMPERATURE; SURFACE MIGRATION; ZNO FILMS; ZNO THIN FILM;

ARGON; ATMOSPHERIC PRESSURE; DEPOSITION; DIAMOND FILMS; ELECTROMAGNETIC INDUCTION; EMISSION SPECTROSCOPY; LIGHT TRANSMISSION; METALLIC FILMS; OPTICAL EMISSION SPECTROSCOPY; OXYGEN; PLASMA DEPOSITION; PLASMAS; ZINC; ZINC OXIDE;

PLASMA DIAGNOSTICS;

EID: 77950592869     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/43/15/155203     Document Type: Article

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