Reactive evaporation of metal wire and microdeposition of metal oxide using atmospheric pressure reactive microplasma jet

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 10 B, 2006, Pages 8228-8234

  Shimizu, Yoshiki ^a   Bose, Arumugam Chandra ^a   Mariotti, Davide ^a   Sasaki, Takeshi ^a   Kirihara, Kazuhiro ^a   Suzuki, Tsunehisa ^b   Terashima, Kazuo ^c   Koshizaki, Naoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b YAMAGATA RESEARCH INSTITUTE OF TECHNOLOGY   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

Atmospheric pressure; CVD; Metal oxide; Microdeposition; Microplasma; Patterning; Plasma jet; Reactive evaporation; Tungsten oxide; Wire spraying

Indexed keywords

ATMOSPHERIC PRESSURE; EVAPORATION; QUARTZ; SUBSTRATES;

METAL OXIDE; MICRODEPOSITION; REACTIVE EVAPORATION; TUNGSTEN OXIDE; WIRE SPRAYING;

WIRE;

EID: 33846041032     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.8228     Document Type: Article

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