Fabrication of spherical carbon via UHF inductively coupled microplasma CVD

Journal of Physics D: Applied Physics

Volumn 36, Issue 23, 2003, Pages 2940-2944

  Shimizu, Yoshiki ^a   Sasaki, Takeshi ^a   Ito, Tsuyohito ^b   Terashima, Kazuo ^b   Koshizaki, Naoto ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALLIZATION; ELECTRON DEVICE MANUFACTURE; GRAPHITE; LOW TEMPERATURE OPERATIONS; METHANE; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; SUBSTRATES;

CARBON NANO ONIONS; CRYSTALLIZED NANOSTRUCTURES; INDUCTIVELY MICROCOUPLED MICROPLASMA; SPHERICAL CARBON;

PLASMAS;

EID: 0346361804     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/23/011     Document Type: Article

References (7)

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3. Ito T and Terashima K 2001 Thin Solid Films 390 234
4. Sankaran R M and Giapis K P 2002 J. Appl. Phys. 92 2406
5. Ito T and Terashima K 2002 Appl. Phys. Lett. 80 2648
6. Komatsu S and Moriyoshi Y 1990 J. Phys. D: Appl. Phys. 23 1244
7. Shimizu Y, Sasaki T, Liang C, Ito T, Terashima K and Koshizaki N in preparation