Improved accuracy in nano beam electron diffraction

Journal of Physics: Conference Series

Volumn 209, Issue , 2010, Pages

  Beche A ^a   Clement L ^b   Rouviere J L ^a  

^a CEA GRENOBLE   (France)

^b STMICROELECTRONICS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE ELEMENT METHOD; GERMANIUM; PROBES;

FINITE ELEMENT SIMULATIONS; NANOBEAM ELECTRON DIFFRACTION; PROBE SIZE; SILICON MATRIX; STRAIN ACCURACY; [110] DIRECTION;

ELECTRON DIFFRACTION;

EID: 77950475475     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/209/1/012063     Document Type: Conference Paper

References (16)

1. Smeys P, Griffin P, Rek Z, De Wolf I and Saraswat K 1999 IEEE Trans. Electron Devices 46 1245
2. Auth C et al 2008 Intel Technol. J. 12 77
3. Bierwolf R, Hohenstein M, Phillipp F, Brandt O, Crook G and Ploog K 1993 Ultramicroscopy 49 273
4. Hue F, Hytch M, Bender H, Houdellier F and Claverie A 2008 Phys. Rev. Lett. 100 156602
5. Clement L, Pantel R, Kwakman L and Rouviere J 2004 Appl. Phys. Lett. 85 651
6. Houdellier F, Roucau C, Clement L, Rouviere J and Casanove M 2006 Ultramicroscopy 106 951
7. Hytch M, Houdellier F, Hue F and Snoeck E 2008 Nature 453 1086
8. Usuda K, Mizuno T, Tezuka T, Sugiyama N, Moriyama Y, Nakaharai S and Takagi S 2004 Appl. Surface Sci. 224 113
9. Usuda K, Numata T and Takagi S 2005 Mater. Sci. Semiconductor Processing 8 155
10. Armigliato A, Frabboni S and Gazzadi G 2008 Appl. Phys. Lett. 93 161906
11. Liu J, Li K, Pandey S, Benistant F, See A, Zhou M, Hsia L, Schampers R and Klenov D 2008 Appl. Phys. Lett. 93 221912
12. Hartmann J et al 2008 Materials Sci. Eng. B 154-155 76
13. Rouviere J and Sarigiannidou E 2005 Ultramicroscopy 106 1
14. Htch MJ, Snoeck E and Kilaas R 1998 Ultramicroscopy 74 131
15. http://www.comsol.com/
16. Krivanek O, Gubbens A and Dellby N 1991 Microscopy Microanalysis Microstructures 2 315