Monitoring the superfilling of blind holes with electrodeposited copper

Journal of the Electrochemical Society

Volumn 157, Issue 4, 2010, Pages

  Luhn, O ^a,b   Radisic, A ^a   Van Hoof, C ^a,c   Ruythooren, W ^a   Celis, J P ^b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

^c Katholieke Universiteit Leuven   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATING SPECIES; BLIND HOLES; CATHODE POTENTIAL; CHLORIDE IONS; COPPER SEED; COPPER SULFATE; ELECTRODE SURFACES; ELECTRODEPOSITED COPPER; FLAT SUBSTRATES; GALVANOSTATIC DEPOSITION; SUPERFILLING;

CHLORINE COMPOUNDS; COPPER METALLOGRAPHY; CORROSION; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; METALLIZING; TANTALUM;

COPPER;

EID: 77949697272     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3301623     Document Type: Article

References (31)

1. E. Beyne, in Proceedings of the IEEE International Interconnect Technology Conference (IITC), IEEE, pp. 1-5 (2006).
2. S. A. Watson and J. Edwards, Trans. Inst. Met. Finish. 0020-2967, 34, 167 (1957).
3. C. Madore, M. Matlosz, and D. Landolt, J. Electrochem. Soc. 0013-4651, 143, 3927 (1996). 10.1149/1.1837318
4. C. Madore and D. Landolt, J. Electrochem. Soc. 0013-4651, 143, 3936 (1996). 10.1149/1.1837319
5. C. -C. Cheng and A. C. West, J. Electrochem. Soc. 0013-4651, 144, 3050 (1997). 10.1149/1.1837957
6. J. J. Kelly, C. Tian, and A. C. West, J. Electrochem. Soc. 0013-4651, 146, 2540 (1999). 10.1149/1.1391968
7. D. Josell, T. P. Moffat, and D. Wheeler, J. Electrochem. Soc. 0013-4651, 154, D208 (2007). 10.1149/1.2434684
8. Y. Cao, P. Taephaisitphongse, R. Chalupa, and A. C. West, J. Electrochem. Soc. 0013-4651, 148, C466 (2001). 10.1149/1.1377898
9. P. M. Vereecken, R. A. Binstead, H. Deligianni, and P. C. Andricacos, IBM J. Res. Dev. 0018-8646, 49, 1 (2005).
10. Y. Qin, X. Li, F. Xue, P. M. Vereecken, P. Andricacos, H. Deligianni, R. D. Braatz, and R. C. Alkire, J. Electrochem. Soc. 0013-4651, 155, D223 (2008). 10.1149/1.2816282
11. T. P. Moffat, D. Wheeler, S. -K. Kim, and D. Josell, J. Electrochem. Soc. 0013-4651, 153, C127 (2006). 10.1149/1.2165580
12. B. Kim, C. Sharbono, T. Ritzdorf, and D. Schmauch, in Proceedings of the 56th IEEE Electronic Components and Technology Conference (ECTC), IEEE, pp. 838-843, (2006).
13. O. Lüehn, J.-P Celis, C. Van Hoof, K. Baert, and W. Ruythooren, ECS Trans., 6 (8), 123 (2007). 10.1149/1.2794459
14. K. Kondo, T. Yonezawa, D. Mikami, T. Okubo, Y. Taguchi, K. Takahashi, and D. P. Barkey, J. Electrochem. Soc. 0013-4651, 152, H173 (2005). 10.1149/1.2041047
15. D. P. Barkey, J. Callahan, A. Keigler, Z. Liu, A. Ruff, J. Trezza, and B. Wu, in Proceedings of the 57th IEEE Electronic Components and Technology Conference (ECTC), IEEE, pp. 638-642 (2007).
16. O. Lühn, C. Van Hoof, W. Ruythooren, and J. -P. Celis, Electrochim. Acta 0013-4686, 54, 2504 (2009). 10.1016/j.electacta.2008.04.002
17. O. Lühn, A. Radisic, P. M. Vereecken, C. Van Hoof, W. Ruythooren, and J. -P. Celis, Electrochem. Solid-State Lett. 1099-0062, 12, D39 (2009). 10.1149/1.3087790
18. A. Radisic, G. Oskam, and P. C. Searson, J. Electrochem. Soc. 0013-4651, 151, C369 (2004). 10.1149/1.1738673
19. J. S. Lewis, S. Gandikota, S. Ramanathan, G. Dixit, R. Cheung, and F. Chen, U.S. Pat. 6797 620 B2 (2004).
20. A. Radisic, O. Lühn, S. Armini, J. Vaes, A. Van Ammel, D. Radisic, M. Delande, W. Ruythooren, and P. M. Vereecken, Abstract 2178, The Electrochemical Society Meeting Abstracts, Vol. 2009-02, Vienna, Austria, Oct 4-9, 2009.
21. S. H. Brongersma, E. Kerr, I. Vervoort, A. Saerens, and K. Maex, J. Mater. Res. 0884-2914, 17, 582 (2002). 10.1557/JMR.2002.0082
22. T. P. Moffat, D. Wheeler, M. Edelstein, and D. Josell, IBM J. Res. Dev. 0018-8646, 49, 19 (2005).
23. O. Lühn, A. Radisic, P. M. Vereecken, B. Swinnen, C. Van Hoof, W. Ruythooren, and J. -P. Celis, in Proceedings of the 58th IEEE Electronic Components and Technology Conference (ECTC), IEEE, pp. 866-870 (2008).
24. A. Radisic, O. Lühn, B. Swinnen, H. Bender, C. Drijbooms, G. Doumen, K. Kellens, W. Ruythooren, and P. M. Vereecken, in Proceedings of MRS Fall Meeting, MRS, pp. E03-E06 (2008).
25. T. P. Moffat, D. Wheeler, and D. Josell, Electrocrystallization in Nanotechnology, Chap., pp. 96-114, Wiley-VCH, Weinheim (2007). 10.1002/9783527610198.ch5
26. T. P. Moffat, B. Baker, D. Wheeler, J. E. Bonevich, M. Edelstein, D. R. Kelly, L. Gan, G. R. Stafford, P. J. Chen, W. F. Egelhoff, J. Electrochem. Soc. 0013-4651, 149, C423 (2002). 10.1149/1.1490357
27. I. Teerlink, Ph.D. Thesis, University of Gent, Belgium (2002).
28. N. Zukauskaite and A. Malinauskas, Elektrokhimiya 0202-8093, 24, 1691 (1988).
29. N. Zukauskaite and A. Malinauskas, Elektrokhimiya 0202-8093, 24, 1694 (1988).
30. J. L. Stickney and C. B. Ehlers, J. Vac. Sci. Technol. A 0734-2101, 7, 1801 (1989). 10.1116/1.576049
31. W. -P. Dow and C. -W. Liu, J. Electrochem. Soc. 0013-4651, 153, C190 (2006). 10.1149/1.2165743