Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Applied Surface Science

Volumn 256, Issue 10, 2010, Pages 3024-3030

  Wang, Gui Gen ^a   Zhang, Hua Yu ^a   Zhou, Hong Fei ^a   Kuang, Xu Ping ^a   Wu, Qi Bao ^b   Zuo, Hong Bo ^a   Han, Jie Cai ^a   Ma, Hong Tao ^c  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b China Fangda Group Co Ltd   (China)

^c SAE Technologies Development (Dongguan) Co Ltd   (China)

Author keywords

Electron cyclotron resonance; Plasma nitriding treatment; Tetrahedral amorphous carbon

Indexed keywords

ALUMINUM NITRIDE; AMORPHOUS CARBON; AMORPHOUS FILMS; AUGER ELECTRON SPECTROSCOPY; BIAS VOLTAGE; CARBON FILMS; CHEMICAL BONDS; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; MAGNETIC DISK STORAGE; MAGNETIC HEADS; MAGNETIC RECORDING; MAGNETIC STORAGE; MAGNETISM; MAGNETOPLASMA; MICROWAVES; NITRIDING; PLASMA APPLICATIONS; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER ELECTRON SPECTROSCOPIES (AES); FILTERED CATHODIC VACUUM ARC; HIGH DENSITY MAGNETIC STORAGE; MICROSTRUCTURE CHARACTERISTICS; PLASMA NITRIDING; STRUCTURAL CHARACTERISTICS; TETRAHEDRAL AMORPHOUS CARBON; TETRAHEDRAL AMORPHOUS CARBON (TA-C) FILMS;

NITROGEN PLASMA;

EID: 77349109032     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.11.067     Document Type: Article

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