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Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 167-171

Spectroscopic study using FTIR, Raman, XPS and NEXAFS of carbon nitride thin films deposited by RF magnetron sputtering

(8) Bouchet Fabre, B a Marino, E a Lazar, G b Zellama, K b Clin, M b Ballutaud, D c Abel, F d Godet, C e

a Centre d Etudes Nucléaires de Saclay (France)

b Universite de Picardie Jules Verne (France)

c Centre National de la Recherche Scientifique (France)

d SORBONNE UNIVERSITÉ (France)

e LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES (France)

Author keywords

Amorphous carbon; Electrical conductivity; IR; NEXAFS; Raman spectroscopy; XPS

Indexed keywords

COMPOSITION; ELECTRIC CONDUCTIVITY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; MAGNETRON SPUTTERING; RAMAN SCATTERING; SPECTROSCOPIC ANALYSIS; THIN FILMS; VIBRATION MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS CARBON; BONDING STRUCTURES; ELECTRICAL PROPERTIES; NEXAFS;

CARBON NITRIDE;

EID: 17644423948 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.11.166 Document Type: Conference Paper

Times cited : (37)

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