Optimization of the sputtering process parameters of GZO films using the Grey-Taguchi method

Ceramics International

Volumn 36, Issue 3, 2010, Pages 979-988

  Chen, Chien Chih ^a   Tsao, Chung Chen ^b   Lin, You Chiuan ^a   Hsu, Chun Yao ^a  

^a LUNGHWA UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b Tahua Institute of Technology   (Taiwan)

Author keywords

Gallium doped zinc oxide; Grey relational analysis; Polymeric substrates; Post annealing; Transparent conductive oxide

Indexed keywords

GREY RELATIONAL ANALYSIS; POLYMERIC SUBSTRATE; POST ANNEALING; TRANSPARENT CONDUCTIVE OXIDES;

ANNEALING; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; GALLIUM; GALLIUM ALLOYS; OPACITY; OPTIMIZATION; POLYETHYLENE TEREPHTHALATES; SUBSTRATES; TAGUCHI METHODS; THERMOPLASTICS; ZINC; ZINC OXIDE;

OPTICAL FILMS;

EID: 76449120019     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2009.11.019     Document Type: Article

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