Influence of post-annealing temperature on the properties exhibited by ITO, IZO and GZO thin films

Thin Solid Films

Volumn 515, Issue 24 SPEC. ISS., 2007, Pages 8562-8566

  Goncalves G ^a   Elangovan, E ^a   Barquinha, P ^a   Pereira, L ^a   Martins, R ^a   Fortunato, E ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

Author keywords

Annealing treatments; Electrical and optical properties; Transparent conductive oxides

Indexed keywords

ANNEALING; OPTICAL PROPERTIES; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING GALLIUM; THERMAL EFFECTS;

ANNEALING TREATMENTS; HIGH TEMPERATURE ANNEALING; ROOM TEMPERATURE; TRANSPARENT CONDUCTIVE OXIDES;

OXIDE FILMS;

EID: 34548859816     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.03.126     Document Type: Article

References (21)

1. Gheidari A.M., Soleimani E.A., Mansorhoseini M., Mohajerzadeh S., Madani N., and Shams K.W. Mater. Res. Bull. 40 (2005) 1303
2. Lan J.H., Kanicki J., Catalano A., Keane J., denBoer W., and Gu T.J. Electron. Mater. 25 (1996) 1806
3. Zhu F.R., Zhang K., Low B.L., Lim S.F., and Chua S.J. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 85 (2001) 114
4. Minami T. Semicond. Sci. Technol. 20 (2005) 35
5. Fortunato E., Assunção V., Gonçalves A., Marques A., Águas H., Pereira L., Ferreira I., Vilarinho P., and Martins R. Thin Solid Films 451 (2004) 443
6. Choi B.H., Im H.B., Song J.S., and Yoon K.H. Thin Solid Films 193/194 (1990) 712
7. Assunção V., Fortunato E., Marques A., Gonçalves A., Ferreira I., Águas H., and Martins R. Thin Solid Films 442 (2003) 102
8. Lee W.J., Fang Y.K., Ho J.J., Chen C.Y., Chiou L.H., Wang S.J., Dai F., Hsieh T., Tsai R.Y., Huang D., and Ho F.C. Solid State Electrochem. 46 (2002) 477
9. Naghavi N., Dupont L., Marcel C., Maugy C., Laïk B., Rougier A., Guéry C., and Tarascon J.M. Electrochim. Acta 46 (2001) 2007
10. Sasabayashi T., Ito N., Nishimura E., Kon M., Song P.K., Utsumi K., Kaijo A., and Shigesato Y. Thin Solid Films 445 (2003) 219
11. Nomura K., Ohta H., Takagi A., Kamiya T., Hirano M., and Hosono H. Nature 432 (2004) 488
12. Fang Z., Yan Z., Tan Y., Liu X., and Wang Y. Appl. Surf. Sci. 241 (2005) 303
13. Yu X., Ma J., Ji F., Wang Y., Zhang X., and Ma H. Thin Solid Films 483 (2005) 296
14. Yaglioglu B., Yeom H., and Paine D.C. J. Appl. Phys. 86 (2005) 261908
15. Li H., Liu H., Wang J., Yao S., Cheng X., and Boughton R.I. Mater. Lett. 58 (2004) 3630
16. Pankove J.I. Optical Processes in Semiconductors (1971), Prentice-Hall, NJ 34
17. Hamberg I., and Granqvist C.G. J. Appl. Phys. 60 (1986) R123
18. Kim K., and Park Y. Appl. Phys. Lett. 78 (2001) 4
19. Shan F.K., and Yu Y.S. J. Eur. Ceram. Soc. 24 (2004) 1869
20. Li Z.Q., Zhang D.X., and Lin J.J. J. Appl. Phys. 99 (2006) 124906
21. Özgür Ü., Alivov Ya.I., Liu C., Teke A., Reshchikov M.A., Doǧan S., Avrutin V., Cho S.-J., and Morkoç H. J. Appl. Phys. 98 (2005) 041301