-
2
-
-
0036974829
-
-
1476-1122. 10.1038/nmat769
-
A. Javey, H. Kim, M. Brink, Q. Wang, A. Ural, J. Guo, P. McIntyre, P. McEuen, M. Lundstrom, and H. J. Dai, Nature Mater. 1476-1122 1, 241 (2002). 10.1038/nmat769
-
(2002)
Nature Mater.
, vol.1
, pp. 241
-
-
Javey, A.1
Kim, H.2
Brink, M.3
Wang, Q.4
Ural, A.5
Guo, J.6
McIntyre, P.7
McEuen, P.8
Lundstrom, M.9
Dai, H.J.10
-
5
-
-
0000044129
-
-
0021-8979. 10.1063/1.373747
-
R. M. Fleming, D. V. Lang, C. D. W. Jones, M. L. Steigwewald, D. W. Murphy, G. B. Alers, Y. H. Wong, R. B. vanDover, J. R. Kwo, and A. M. Sergent, J. Appl. Phys. 0021-8979 88, 850 (2000). 10.1063/1.373747
-
(2000)
J. Appl. Phys.
, vol.88
, pp. 850
-
-
Fleming, R.M.1
Lang, D.V.2
Jones, C.D.W.3
Steigwewald, M.L.4
Murphy, D.W.5
Alers, G.B.6
Wong, Y.H.7
Vandover, R.B.8
Kwo, J.R.9
Sergent, A.M.10
-
6
-
-
0033538273
-
Does chemistry really matter in the chemical vapor deposition of titanium dioxide? Precursor and kinetic effects on the microstructure of polycrystalline films
-
DOI 10.1021/ja984446f
-
C. J. Taylor, D. C. Gilmer, D. Colombo, G. D. Wilk, S. A. Campbell, J. Roberts, and W. L. Gladfelter, J. Am. Chem. Soc. 0002-7863 121, 5220 (1999). 10.1021/ja984446f (Pubitemid 29275729)
-
(1999)
Journal of the American Chemical Society
, vol.121
, Issue.22
, pp. 5220-5229
-
-
Taylor, C.J.1
Gilmer, D.C.2
Colombo, D.G.3
Wilk, G.D.4
Campbell, S.A.5
Roberts, J.6
Gladfelter, W.L.7
-
8
-
-
13744250526
-
Hybrid titanium-aluminum oxide layer as alternative high-k gate dielectric for the next generation of complementary metal-oxide-semiconductor devices
-
DOI 10.1063/1.1856137, 042904
-
O. Auciello, W. Fan, B. Kabius, S. Saha, J. A. Carlisle, R. P. H. Chang, C. Lopez, E. A. Irene, and R. A. Baragiola, Appl. Phys. Lett. 0003-6951 86, 042904 (2005). 10.1063/1.1856137 (Pubitemid 40238044)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.4
, pp. 0429041-0429043
-
-
Auciello, O.1
Fan, W.2
Kabius, B.3
Saha, S.4
Carlisle, J.A.5
Chang, R.P.H.6
Lopez, C.7
Irene, E.A.8
Baragiola, R.A.9
-
9
-
-
0037096520
-
-
0163-1829. 10.1103/PhysRevB.65.233106
-
X. Zhao and D. Vanderbilt, Phys. Rev. B 0163-1829 65, 233106 (2002). 10.1103/PhysRevB.65.233106
-
(2002)
Phys. Rev. B
, vol.65
, pp. 233106
-
-
Zhao, X.1
Vanderbilt, D.2
-
11
-
-
3142764683
-
-
0884-2914. 10.1557/JMR.2004.0234
-
T. A. Lee and A. Navrotsky, J. Mater. Res. 0884-2914 19, 1855 (2004). 10.1557/JMR.2004.0234
-
(2004)
J. Mater. Res.
, vol.19
, pp. 1855
-
-
Lee, T.A.1
Navrotsky, A.2
-
12
-
-
0028382896
-
-
0002-7820. 10.1111/j.1151-2916.1994.tb07035.x
-
D. J. Kim, S. H. Hyun, S. G. Kim, and M. Yashima, J. Am. Ceram. Soc. 0002-7820 77, 597 (1994). 10.1111/j.1151-2916.1994.tb07035.x
-
(1994)
J. Am. Ceram. Soc.
, vol.77
, pp. 597
-
-
Kim, D.J.1
Hyun, S.H.2
Kim, S.G.3
Yashima, M.4
-
13
-
-
31644434092
-
Nanocrystalline zirconia-yttria system-a Raman study
-
DOI 10.1016/j.matlet.2005.10.102, PII S0167577X05010888
-
A. Ghosh, A. K. Sri, M. M. Pandey, S. Thomas, T. R. R. Moham, and B. T. Rao, Mater. Lett. 0167-577X 60, 1170 (2006). 10.1016/j.matlet.2005.10.102 (Pubitemid 43171845)
-
(2006)
Materials Letters
, vol.60
, Issue.9-10
, pp. 1170-1173
-
-
Ghosh, A.1
Suri, A.K.2
Pandey, M.3
Thomas, S.4
Rama Mohan, T.R.5
Rao, B.T.6
-
14
-
-
4043168501
-
Unexpected magnetism in a dielectric oxide
-
DOI 10.1038/430630a
-
M. Venkatesan, C. B. Fitzgerald, and J. M. D. Coey, Nature (London) 0028-0836 430, 630 (2004). 10.1038/430630a (Pubitemid 39061670)
-
(2004)
Nature
, vol.430
, Issue.7000
, pp. 630
-
-
Venkatesan, M.1
Fitzgerald, C.B.2
Coey, J.M.D.3
-
15
-
-
20844437263
-
Electrical characteristics of postdeposition annealed Hf O2 on silicon
-
DOI 10.1063/1.1927273, 202902
-
R. Puthenkovilakam, M. Sawkar, and J. P. Chang, Appl. Phys. Lett. 0003-6951 86, 202902 (2005). 10.1063/1.1927273 (Pubitemid 40861030)
-
(2005)
Applied Physics Letters
, vol.86
, Issue.20
, pp. 1-3
-
-
Puthenkovilakam, R.1
Sawkar, M.2
Chang, J.P.3
-
16
-
-
0042267310
-
-
0021-8979. 10.1063/1.1585116
-
J. Y. Dai, P. F. Lee, K. H. Wong, H. L. W. Chan, and C. L. Choy, J. Appl. Phys. 0021-8979 94, 912 (2003). 10.1063/1.1585116
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 912
-
-
Dai, J.Y.1
Lee, P.F.2
Wong, K.H.3
Chan, H.L.W.4
Choy, C.L.5
-
17
-
-
0036573608
-
-
0163-1829. 10.1103/PhysRevB.65.174117
-
A. S. Foster, G. F. Lopez, A. L. Shluger, and R. M. Nieminen, Phys. Rev. B 0163-1829 65, 174117 (2002). 10.1103/PhysRevB.65.174117
-
(2002)
Phys. Rev. B
, vol.65
, pp. 174117
-
-
Foster, A.S.1
Lopez, G.F.2
Shluger, A.L.3
Nieminen, R.M.4
|