Nanocrystalline cobalt-based films with high thermal stability from a single molecule

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 1, 2010, Pages 54-60

  Henderson, Lucas B ^a   Rivers, Joseph H ^b   Bost, Daniel E ^a   Jones, Richard A ^b   Ekerdt, John G ^a  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CO FILMS; CRYSTALLITE PRECIPITATION; DEPOSITED FILMS; HIGH THERMAL STABILITY; NANOCRYSTALLINE COBALT; NANOCRYSTALLINE MICROSTRUCTURES; NANOCRYSTALLINES; SINGLE MOLECULE; SINGLE-SOURCE PRECURSOR; SUBSTRATE TEMPERATURE; TETRAKIS; TRIMETHYLPHOSPHINES;

CRYSTALLITES; NANOCRYSTALLINE ALLOYS; SILICON COMPOUNDS;

COBALT;

EID: 73849103847     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3264480     Document Type: Article

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