Cycle of two-step etching process using ICP for diamond MEMS applications

Diamond and Related Materials

Volumn 16, Issue 4-7 SPEC. ISS., 2007, Pages 996-999

  Yamada, Takatoshi ^a   Yoshikawa, Hiromichi ^a   Uetsuka, Hiroshi ^a   Kumaragurubaran, Somu ^a   Tokuda, Norio ^a   Shikata, Shin ichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Diamond; Gene surgery tip; ICP etching

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIAMONDS; ENERGY DISPERSIVE X RAY ANALYSIS; INDUCTIVELY COUPLED PLASMA; MEMS; SCANNING ELECTRON MICROSCOPY; SILICA;

DIAMOND SURFACES; ETCHING MASK; ETCHING RATE; GENE SURGERY TIPS;

ETCHING;

EID: 34047276464     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.023     Document Type: Article

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