Codeposition on diamond film surface during reactive ion etching in SF6 and O2 plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2779-2784

  Teii, K ^a   Hori, M ^a   Goto, T ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA ETCHING; POLYCRYSTALLINE MATERIALS; RAMAN SPECTROSCOPY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

SULFUR HEXAFLUORIDE;

DIAMOND FILMS;

EID: 0034318783     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1316098     Document Type: Article

References (20)

1. F. J. Himpsel, J. A. Knapp, J. A. van Vechten, and D. E. Eastman, Phys. Rev. B 20, 624 (1979).
2. C.-L. Cheng, J.-C. Lin, H.-C. Chang, and J.-K. Wang, J. Chem. Phys. 105, 8977 (1996).
3. M. McGonigal, J. N. Russell, Jr., P. E. Pehrsson, H. G. Maguire, and J. E. Butler, J. Appl. Phys. 77, 4049 (1995).
4. E. Johansson and J.-O. Carlsson, Diamond Relat. Mater. 4, 155 (1995).
5. C.-L. Cheng, H.-C. Chang, J.-C. Lin, and K.-J. Song, Phys. Rev. Lett. 78, 3713 (1997).
6. X. Jiang, W. J. Zhang, and C.-P. Klages, Phys. Rev. B 58, 7064 (1998).
7. M. S. So, S.-G. Lim, and T. N. Jackson, J. Vac. Sci. Technol. B 17, 2055 (1999).
8. H. Kawarada, H. Sasaki, and A. Sato, Phys. Rev. B 52, 11351 (1995).
9. M. Weiler, S. Sattel, K. Jung, H. Ehrhardt, V. S. Veerasamy, and J. Robertson, Appl. Phys. Lett. 64, 2797 (1994).
10. P. Chabert, R. W. Boswell, and C. Davis, J. Vac. Sci. Technol. A 16, 78 (1998).
11. D. Margreiter, G. Walder, H. Deutsch, H. U. Poll, C. Winkler, K. Stephan, and T. D. Märk, Int. J. Mass Spectrom. Ion Processes 100, 143 (1990).
12. M. A. Tamor and W. C. Vassell, J. Appl. Phys. 76, 3823 (1994).
13. R. J. Nemanich, J. T. Glass, G. Lucovsky, and R. E. Schroder, J. Vac. Sci. Technol. A 6, 1783 (1988).
14. K. M. Eisele, J. Electrochem. Soc. 128, 123 (1981).
15. Y. Lifshitz, G. D. Lempert, and E. Grossman, Phys. Rev. Lett. 72, 2753 (1994).
16. H. J. Steffen, D. Marton, and J. W. Rabalais, Phys. Rev. Lett. 68, 1726 (1992).
17. J. Koike, D. M. Parkin, and T. E. Mitchell, Appl. Phys. Lett. 60, 1450 (1992).
18. N. R. Rueger, J. J. Beulens, M. Schaepkens, M. F. Doemling, J. M. Mirza, T. E. F. M. Standaert, and G. S. Oehrlein, J. Vac. Sci. Technol. A 15, 1881 (1997).
19. M. Schaepkens, T. E. F. M. Standaert, N. R. Rueger, P. G. M. Sebel, G. S. Oehrlein, and J. M. Cook, J. Vac. Sci. Technol. A 17, 26 (1999).
20. K. Teii, M. Hori, M. Ito, T. Goto, and N. Ishii, J. Vac. Sci. Technol. A 18, 1 (2000).