Understanding the base development mechanism of hydrogen silsesquioxane

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2628-2634

  Kim, Jihoon ^a,d   Chao, Weilun ^b   Griedel, Brian ^c   Liang, Xiaogan ^b   Lewis, Mark ^a   Hilken, Dawn ^b   Olynick, Deirdre ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c Weaver Austin Villeneuve and Sampson LLP   (United States)

^d Princeton University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BASE SOLUTION; CHLORIDE SALTS; DISSOLUTION MECHANISM; DOSE-DEPENDENT; HYDROGEN SILSESQUIOXANE; ION SIZE; MATRIX; REACTION MECHANISM; SALT MIXTURES; TETRAMETHYL AMMONIUM HYDROXIDE;

AMMONIUM COMPOUNDS; DISSOLUTION; HYDRATES; HYDRATION; ION EXCHANGE; IONS; OXIDE MINERALS; QUARTZ; SODIUM CHLORIDE;

SURFACE REACTIONS;

EID: 72849112160     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3250261     Document Type: Conference Paper

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