Quantum chemical study of silicon oxide surface reaction with (poly)silane

Applied Surface Science

Volumn 117-118, Issue , 1997, Pages 61-66

  Tachibana, Akitomo ^a   Yano, Tasuku ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

CVD; Quantum chemistry; Reaction; Silane; Silicon oxide

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; HYDROGEN BONDS; POLYSILANES; SILICA; SURFACE PHENOMENA;

QUANTUM CHEMISTRY;

SILANES;

EID: 0031548607     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80052-9     Document Type: Article

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