InN layers grown by MOCVD on SrTiO3 substrates

Journal of Crystal Growth

Volumn 312, Issue 3, 2010, Pages 373-377

  Jia, C H ^a   Chen, Y H ^a   Zhou, X L ^a   Liu, G H ^a   Guo, Y ^a   Liu, X L ^a   Yang, S Y ^a   Wang, Z G ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A1. Growth behavior; A1. SrTiO3; A3. MOCVD; B1. InN

Indexed keywords

FUNCTIONAL OXIDES; GROWTH BEHAVIOR; IN-PLANE ORIENTATION; INN FILMS; INN LAYERS; INN THIN FILMS; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; PHOTOLUMINESCENCE EMISSION; SRTIO; WURTZITES;

CRYSTAL GROWTH; DEPOSITION; EPITAXIAL FILMS; INDIUM COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; SUBSTRATES; ZINC SULFIDE;

STRONTIUM ALLOYS;

EID: 72649091529     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.10.066     Document Type: Article

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