Study of in-plane orientation of epitaxial AlN films grown on (111) SrTiO3

Applied Physics Letters

Volumn 92, Issue 24, 2008, Pages

  Yao, Z Q ^a   Fan, X ^a   He, B ^a   Zhang, W J ^a   Bello, I ^a   Lee, S T ^a   Meng, X M ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; III-V SEMICONDUCTORS; INTERFACES (MATERIALS); STRONTIUM TITANATES; SUBSTRATES; TITANIUM COMPOUNDS;

CHEMICAL ETCHING; IN-PLANE ORIENTATION; INCREASING TEMPERATURES; MODEL-BASED OPC; MODERATE TEMPERATURE; ORIENTATION RELATIONSHIP; SHARP INTERFACE; SUBSTRATE TEMPERATURE;

EPITAXIAL GROWTH;

EID: 45849143319     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2948854     Document Type: Article

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