Properties of n-type ZnN thin films as channel for transparent thin film transistors

Thin Solid Films

Volumn 518, Issue 4, 2009, Pages 1036-1039

  Aperathitis, E ^a   Kambilafka, V ^a   Modreanu, M ^b  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

OES; Sputtering; TFT; Thin film; Zinc nitride

Indexed keywords

CHANNEL LAYERS; ELECTRICAL PROPERTY; HIGHER TEMPERATURES; LOW RESISTIVITY; NITRIDE THIN FILMS; NITROGEN ANNEALING; OES; RF-MAGNETRON SPUTTERING; RF-POWER; TFT; TRANSISTOR CHARACTERISTICS; TRANSPARENT THIN FILM TRANSISTOR;

ANNEALING; CARRIER CONCENTRATION; CONDUCTIVE FILMS; ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; NITRIDES; THIN FILM TRANSISTORS; THIN FILMS; ZINC; ZINC COMPOUNDS;

VAPOR DEPOSITION;

EID: 71649108293     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.155     Document Type: Article

References (23)

1. Nomura K., Ohta H., Ueda K., Kamiya T., Hirano M., and Hosono H. Science 300 (2003) 1269
2. Wager J.F. Science 300 (2003) 1245
3. Paine D.C., Yaglioglu B., Beiley Z., and Lee S. Thin Solid Films 516 (2008) 5894
4. Martins R., Barquinha P., Ferreira I., Pereira L., Goncalves G., and Fortunato E. J. Appl. Phys. 101 (2007) 044505
5. Hong D., Chiang H.Q., and Wager F.G. J. Vac. Sci. Technol. B24 (2006) L23
6. Martins R. "Amorphous Oxide semiconductors: from Materials to devices", presented at the 2nd International Symposium on Transparent Conductive Oxides (ISTCO) (Oct. 21-24, 2008), Crete, Greece
7. Kumoni H., Nomura K., Kamiya T., and Hosono H. Thin Solid Films 516 (2008) 1516
8. Transparent Electronics. In: Wager J.F., Keszler D.A., and Presley R.E. (Eds). Springer Science + Business Media (2008). 978-0-387-72341-9
9. Li B.S., Liu Y.C., Zhi Z.Z., Shen D.Z., Lu Y.M., Zhang J.Y., Fan X.W., Mu R.X., and Henderson D.O. J. Mater. Res. 18 (2003) 8
10. Wang C., Ji Z., Liu K., Xiang Y., and Ye Z. J. Crystal Growth 259 (2003) 279
11. Wang D., Liu Y.C., Mu R., Zhang J.Y., Lu Y.M., Shen D.Z., and Fan X.W. J. Phys.: Condens. Matter 16 (2004) 4635
12. Kaminska E., Piotrowska A., Kossut J., Butkute R., Dobrowolski W., Lukasiewicz R., Barcz A., Jakieta R., Dynowska E., Przezdziecka E., Aleszkiewicz M., Wojnar P., and Kowalczyk E. Phys. Status Solidi C 2 (2005) 1119
13. Nakano Y., Morikawa T., Ohwaki T., and Taga Y. Appl. Phys. Lett. 88 (2006) 172103
14. Kambilafka V., Voulgaropoulou P., Dounis S., Iliopoulos E., Androulidaki M., Tsagaraki K., Saly V., Ruzinsky M., Prokein P., and Aperathitis E. Thin Solid Films 515 (2007) 8573
15. Kambilafka V., Voulgaropoulou P., Dounis S., Iliopoulos E., Androulidaki M., Saly V., Ruzinsky M., and Aperathitis E. Superlattices & Microstruct. 42 (2007) 55
16. Kyriyama K., Takahashi Y., and Sunohara F. Phys. Rev. B 48 (1993) 2781
17. Suda T., and Kakishita K. J. Appl. Phys. 99 (2006) 076101
18. Zong F., Ma H., Du W., Ma J., Zhang X., Xiao H., Ji F., and Xue C. Appl. Surf. Sci. 252 (2006) 7983
19. Aperathitis E., Hatzopoulos Z., Androulidaki M., Foukaraki V., Kondilis A., Scott C.G., Sands D., and Panayotatos P. Sol. Energy Mater. Sol. Cells 45 (1997) 161
20. Modreanu M., Sancho-Parramon J., Durand O., Servet B., Stchakovsky M., Eypert C., Naudin C., Knowles A., Bridou F., and Ravet M.-F. Appl. Surf. Sci. 253 (2006) 328
21. Klini A., Manousaki A., Anglos D., and Fotakis C. J. Appl. Phys. 98 (2005) 123301
22. Futsuhara M., Yoshioka K., and Takai O. Thin Solid Films 322 (1998) 274
23. Romeluere J.F., Svob L., Jomard F., Mimila-Arroyo J., Lusson A., Sallet V., and Marfaing Y. Appl. Phys. Lett. 83 (2003) 287