Structure and optical constants of electron beam deposited zinc nitride films

EPJ Applied Physics

Volumn 48, Issue 2, 2009, Pages

  Mohamed, H A ^a,b  

^a Sohag University   (Egypt)

^b KING SAUD UNIVERSITY   (Saudi Arabia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS STRUCTURES; ANNEALED FILMS; ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; DISPERSION PARAMETERS; ELECTRON BEAM EVAPORATION; EXTINCTION COEFFICIENTS; HIGH TEMPERATURE; NITRIDE FILMS; OPTICAL GAP; OPTICAL PARAMETER; STRUCTURAL AND OPTICAL PROPERTIES; ZNO;

AMORPHOUS FILMS; ELECTRON BEAMS; HEAT TREATMENT; INTEGRATED OPTOELECTRONICS; NITRIDES; OPTICAL CONSTANTS; REFRACTIVE INDEX; ZINC; ZINC COMPOUNDS; ZINC OXIDE;

OPTICAL FILMS;

EID: 70449580642     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap/2009151     Document Type: Article

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