Polymers for microlithographic applications: New directions and challenges

Macromolecular Symposia

Volumn 175, Issue , 2001, Pages 185-196

  Reichmanis, Elsa ^a   Nalamasu, Omkaram ^a   Houlihan, Francis M ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC DEVICE; FABRICATION TECHNOLOGIES; HIGHER RESOLUTION; LITHOGRAPHY TOOLS; MANUFACTURING ENVIRONMENTS; MATERIALS STRUCTURE; MICRO-LITHOGRAPHY; NEW DIRECTIONS; NEW FORMS; PERFORMANCE ATTRIBUTES; POLYMER MATERIALS; PROCESS REQUIREMENTS; RESEARCH EFFORTS; TRADITIONAL MATERIALS; WAVELENGTH OF LIGHT;

INTEGRATED CIRCUITS; MALEIC ANHYDRIDE; OLEFINS; POLYMERS;

MATERIALS PROPERTIES;

EID: 70449506034     PISSN: 10221360     EISSN: 15213900     Source Type: Journal    
DOI: 10.1002/1521-3900(200110)175:1<185::AID-MASY185>3.0.CO;2-H     Document Type: Article

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