Single-layer resist design for 193nm lithography

Solid State Technology

Volumn 42, Issue 5, 1999, Pages 29-38

  Nalamasu, Omkaram ^a   Houlihan, Francis M ^a   Cirelli, Raymond A ^a   Watson, George Patrick ^a   Reichmanis, Elsa ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002811027     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (14)

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12. F.M. Houlihan et al., unpublished results to be presented at SPIE Conference on Microlithography, 1999.
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14. R.A. Cirelli, et al., Journal of Vac. Sci. and Technol. B, Nov./Dec. 1996.