Fabrication of 3D nano-structured ITO films by RF magnetron sputtering

Current Nanoscience

Volumn 5, Issue 3, 2009, Pages 297-301

  Wang, Gou Jen ^a   Chen, He Tsing ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC ALUMINUM OXIDE; ARRAY-ELECTRODE; BARRIER LAYERS; CRYSTALLINITIES; DYE-SENSITIZED SOLAR CELLS; ELECTROPHORETIC DEPOSITIONS; I - V CURVE; ITO FILMS; ITO THIN FILMS; NANO-STRUCTURED; RF-MAGNETRON SPUTTERING; TIO; XRD ANALYSIS;

ELECTROPHORESIS; FLIGHT DYNAMICS; MAGNETRON SPUTTERING; MAGNETRONS; NANOSTRUCTURES; OXIDE FILMS; PHOSPHORIC ACID; PHOTOVOLTAIC CELLS; SOLAR CELLS; THIN FILMS; THREE DIMENSIONAL; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

ALUMINA;

INDIUM TIN OXIDE; NANOFILM; NANOMATERIAL; PHOSPHORIC ACID;

ARTICLE; BIOSENSOR; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; NANOFABRICATION; PRIORITY JOURNAL; RADIOFREQUENCY; SCANNING ELECTRON MICROSCOPY; THREE DIMENSIONAL IMAGING; X RAY DIFFRACTION;

EID: 70350702779     PISSN: 15734137     EISSN: None     Source Type: Journal    
DOI: 10.2174/157341309788921462     Document Type: Article

References (36)

1. 3 films: Basic optical properties and applications to energy-efficient windows. J. Appl. Phys., 1986, 60, R123-R160.
2. Osaza, K.; Ye, T.; Aoyagi, Y. Deposition of thin indium oxide film and its application to selective epitaxy for in situ processing. Thin Solid Films, 1994, 246, 58-64.
3. Luff, B. J.; Wilkinson, J. S.; Perrone, G. Indium tin oxide overlayered waveguides for sensor applications. Appl. Opt., 1997, 36(27), 7066-7072. (Pubitemid 128487103)
4. 3 thin-film semiconductor gas sensor. Sensor Actuator B, 1995, 24-25, 548-551.
5. Bellingham, J.R.; Mackenize, A.P., Philips, W.A. Precise measurements of oxygen content: oxygen vacancies in transparent conducting indium oxide films. Appl. Phys. Lett., 1991, 58(22), 2506-2508.
6. 2 gas sensors. Thin Solid Films, 1990, 186, 349-360.
7. Marotta, V.; Orlando, S.; Parisi, G.P.; Giardini, A. Sensors based on pulsed laser deposition of multilayers of metal oxides. Appl. Surf. Sci., 2000, 154/155, 640-646. (Pubitemid 30573102)
8. Salehi, A. Preparation and characterization of proton implanted indium tin oxide selective gas sensors. Sensors Actuators B, 2003, 94, 184-188.
9. Jiao, Z.; Wu, M.; Gu, J.; Sun, X. The gas sensing characteristics of ITO thin film prepared by sol-gel method. Sensors Actuators B, 2003, 94, 216-221.
10. Hattori, A.; Tachibana, H.; Yoshiike, N.; Yoshida, A. Ozone sensor made by dip coating method. Sensors Actuators A, 1999, 77, 120-125.
11. Patel, N.G.; Patel, P.D.; Vaishnav, V.S. Indium tin oxide (ITO) thin film gas sensor for detectionof methanol at room temperature. Sensors Actuators B, 2003, 96, 180-189.
12. Patel, N.G.; Makhija, K.K.; Panchal, C.J.; Dave, D.B.; Vaishnav, V.S. Fabrication of carbon tetrachloride gas sensors using indium tin oxide thin films. Sensors Actuators B, 1995, 23, 49-53.
13. Zhu, F.; Huan, C.H.A.; Zhang, K.; Wee, A.T.S. Investigation of annealing effects on indium tin oxide thin films by electron energy loss spectroscopy. Thin Solid Films, 2001, 359, 244-250.
14. Chandrasekhar, R.; Choy, K.L. Innovative and cost-effective synthesis of indium tin oxide films. Thin Solid Films, 2001, 398-399, 59-64.
15. Kim, S.S.; Choi, S.Y.; Park, C.G.; Jin, H.W. Transparent conductive ITO thin films through the sol-gel process using metal salts. Thin Solid Films, 1999, 347, 155-160.
16. Cali, C.; Mosa, M.; Taragia, G. Deposition of indium tin oxide films by laser ablation: processing and characterization. Solid State Electron., 1998, 42, 877-879. (Pubitemid 128403812)
17. Meng, L.J.; dos Santos, M.P. Properties of indium tin oxide (ITO) films prepared by R.F. reactive magnetron sputtering at different pressures. Thin Solid Films, 1997, 303, 151-155.
18. Betz, U.; Olsson K.; Marthy, J.; Escolá, M.F. On the synthesis of ultra smooth ITO thin films by conventional direct current magnetron sputtering. Thin Solid Films, 2008, 516, 1334-1340. (Pubitemid 351172383)
19. Lee, C.T.; Yu, Q.X.; Tang, B.T.; Lee, H.Y. Effects of plasma treatment on the electrical and optical properties of indium tin oxide films fabricated by R.F. reactive sputtering. Thin Solid Films, 2001, 386, 105-110. (Pubitemid 32264393)
20. Thilakan, P.; Minarini, C.; Loreti, S.; Terzini, E. Investigations on the crystallization properties of RF magnetron sputtered indium tin oxide thin films. Thin Solid Films, 2001, 388, 34-40. (Pubitemid 32335207)
21. Yeom, H.Y.; Popovich, N.; Chason, E.; Paine, D.C. A study of the effect of process oxygen on stress evolution in D.C. magnetron-deposited tin-doped indium oxide. Thin Solid Films, 2002, 411, 17-22.
22. Chen, Y.Q.; Jiang, J.; Wang, B.; Hou, J.G. Synthesis of tin-doped indium oxide nanowires by self-catalytic VLS growth. J. Phys. D: Appl. Phys., 2004, 37, 3319-3322.
23. Wan, Q.; Song, Z.T.; Feng, S.L.; Wang, T.H. Single-crystalline tin-doped indium oxide whiskers: synthesis and characterization. Appl. Phys. Lett., 2004, 85, 4759-4761.
24. Yu, D.; Wang, D.; Yu, W.; Qian, Y. Synthesis of ITO nanowires and nanorods with corundum structure by a co-precipitation-anneal method. Mater. Lett., 2003, 58, 84-87.
25. Takaki, S.; Aoshima, Y., Satoh, R. Fabrication of indium tin oxide whiskers by sputtering. Jpn. J. Appl. Phys., 2006, 45, 2714-2721.
26. Vossen, J.L.; Kern, W. Eds., Thin Film Processes II; Academic Press: New York, 1991.
27. Asoh, H.; Nishio, K.; Nakao, M.; Tamamura, T.; Masuda, H. Conditions for fabrication of ideally ordered anodic porous alumina using pretextured Al. J. Electrochem. Soc., 2001, 148, B152-B156. (Pubitemid 33693431)
28. Hwang, S. K.; Lee, J.; Jeong, S. H.; Lee, P. S.; Lee, K. H. Fabrication of carbon nanotube emitters in an anodic aluminum oxide nanotemplate on a Si wafer by multi-step anodization. Nanotechnology, 2005, 16, 850-858.
29. Yanagishita, T.; Nishio, K.; Masuda, H. Fabrication of metal nanohole arrays with high aspect ratios using two-step replication of anodic porous alumina. Adv. Mater., 2005, 17(18), 2241-2243. (Pubitemid 41338533)
30. Feng, L.; Wiley, J. B. Preparation of free-standing metal wire arrays by in situ assembly. J. Mater. Chem., 2008, 18, 3977-3980.
31. Liu, L.; Lee, W.; Huang, Z.; Scholz, R.; Gösele, U. Fabrication and characterization of a flow-through nanoporous gold nanowire/AAO composite membrane. Nanotechnology, 2008, 19, 335604.
32. Uthanna, S.; Reddy, P.S.; Naidu, B.S.; Reddy, P.J. Physical investigations of DC magnetron sputtered indium tin oxide films. Vacuum, 1996, 47, 91-93. (Pubitemid 126341408)
33. Karasawa, T.; Miyata, Y. Electrical and optical properties of indium tin oxide thin films deposited on unheated substrates by D.C. reactive sputtering. Thin Solid Films, 1993, 223, 135-139.
34. Meng, L.J.; Macarico, A.; Martins, R. Study of annealed indium tin oxide films prepared by RF reactive magnetron sputtering. Vacuum, 1995, 46, 673-680.
35. Meng, L.J.; Placido, F. Annealing effect on ITO thin films prepared by microwave-enhanced dc reactive magnetron sputtering for telecomunication applications. Surf. Coat. Technol., 2003, 166, 44-50. (Pubitemid 36128715)
36. Bhagwat, S.; Howson, R.P. Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films. Surf. Coat. Technol., 1999, 11, 163-171. (Pubitemid 32626312)