Deposition of indium tin oxide films by laser ablation: Processing and characterization

Solid-State Electronics

Volumn 42, Issue 5, 1998, Pages 877-879

  Cali C ^a   Mosca, M ^a   Targia, G ^a  

^a UNIVERSITY OF PALERMO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; LASER ABLATION; NEODYMIUM LASERS; PULSED LASER APPLICATIONS; SEMICONDUCTING INDIUM COMPOUNDS; SUBSTRATES; THIN FILMS;

INDIUM TIN OXIDE;

SEMICONDUCTING FILMS;

EID: 0032066721     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(98)00084-7     Document Type: Article

References (8)

1. Calì, C., La Rosa, F., Targia, G. and Robba, D., J. Appl. Phys., 1995, 78, 6265.
2. Zheng, J. P. and Kwok, H. S., Appl. Phys. Lett., 1993, 63, 1.
3. Zheng, J. P., Ying, Q. Y., Witanachchi, S., Huang, Z. Q., Shaw, D. T. and Kwok, H. S., Appl. Phys. Lett., 1989, 54, 954.
4. Horwitz, J. S. and Sprague, J. A., Pulsed Laser Deposition of Thin Films, eds. D. B. Chreisey and G. K. Hubler. John-Wiley and Sons, New York, 1994.
5. Macleod, H. A., Thin-film Optical Filters. A. Hilger, 1986.
6. Hamberg, I. and Granqvist, C. G., J. Appl. Phys., 1986, 60, R123.
7. Biunno, N., Narayan, J., Srivatsa, A. R. and Holland, O. W., Appl. Phys. Lett., 1989, 55, 405.
8. Bostanjoglo, O., Niedrig, R. and Wedel, B., J. Appl. Phys., 1994, 76, 3045.