A study of the effect of process oxygen on stress evolution in d.c. magnetron-deposited tin-doped indium oxide

Thin Solid Films

Volumn 411, Issue 1, 2002, Pages 17-22

  Yeom, Hyo Young ^a   Popovich, Natasha ^a   Chason, Eric ^a   Paine, David C ^a  

^a BROWN UNIVERSITY   (United States)

Author keywords

Amorphous; Crystallization; Evolution; Indium tin oxide; ITO; Kinetics; Low temperature processing; Stress; Transparent conducting oxides; Vacancy; Volume

Indexed keywords

CRYSTALLIZATION; CURRENT DENSITY; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; PARTIAL PRESSURE; REACTION KINETICS; SPUTTER DEPOSITION; STOICHIOMETRY; STRESS ANALYSIS; THICK FILMS; TIN;

HALL MOBILITY;

THIN FILMS;

EID: 0037157434     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00166-9     Document Type: Article

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