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Journal of Applied Physics

Volumn 106, Issue 6, 2009, Pages

Correlation between surface chemistry and ion energy dependence of the etch yield in multicomponent oxides etching

(7) Brub P M a Poirier, J S a Margot, J a Stafford, L a Ndione, P F b Chaker, M b Morandotti, R b

a UNIVERSITÉ DE MONTRÉAL (Canada)

b INRS EMT (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCHING; ENERGY THRESHOLDS; ETCH YIELD; ETCHING REACTION; INDUCTIVELY-COUPLED; ION ENERGIES; MULTI-COMPONENT OXIDES; NON-VOLATILE; RATE-LIMITING STEPS;

BARIUM; CALCIUM; CAPILLARITY; CHLORINE; DESORPTION; IONS; NIOBIUM; PLASMA ETCHING; PLASMAS; PULSED LASER APPLICATIONS; SURFACE CHEMISTRY; SURFACES;

BARIUM COMPOUNDS;

EID: 70349640176 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3223350 Document Type: Article

Times cited : (5)

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