Influence of redeposition on the plasma etching dynamics

Journal of Applied Physics

Volumn 101, Issue 8, 2007, Pages

  Stafford, L ^a   Margot, J ^b   Delprat, S ^c   Chaker, M ^c   Pearton, S J ^a  

^a UNIVERSITY OF FLORIDA   (United States)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

^c INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; MEASUREMENT THEORY; PHOTORESISTS; PLATINUM; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS;

HIGH-DENSITY ARGON PLASMA; PLASMA ETCHING DYNAMICS; STRONTIUM-BISMUTH-TANTALATE (SBT);

PLASMA ETCHING;

EID: 34247631722     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2719015     Document Type: Conference Paper

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