Dependence of the sputter-etching characteristics of strontium-titanate- oxide thin films on their structural properties

Applied Physics Letters

Volumn 84, Issue 14, 2004, Pages 2500-2502

  Stafford, L ^a   Gaidi, M ^b   Chaker, M ^b   Langlois, O ^a   Margot, J ^a   Schiettekatte, F ^a   Wei, P ^a  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b INRS EMT   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING ENERGY; CRYSTAL ORIENTATION; ETCHING; EXCIMER LASERS; FILM GROWTH; LATTICE CONSTANTS; MAGNETIC FIELD EFFECTS; OPTIMIZATION; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; STRONTIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

FILM DENSITY; ION ENERGIES; PRESSURE DEPENDENCE; SPUTTER-ETCHING; X-RAY DIFFRACTION SPECTROMETRY;

THIN FILMS;

EID: 2342515381     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1702131     Document Type: Article

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