Etch characteristics of (Pb,Sr)TiO3 thin films using CF 4/Ar inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages 1616-1619

  Kim, Gwan Ha ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; ETCHING; LEAD COMPOUNDS; STRONTIUM COMPOUNDS; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

ION-ASSISTED ETCHING MECHANISMS;

THIN FILMS;

EID: 0142027023     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1593049     Document Type: Conference Paper

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