Influence of ion mixing on the energy dependence of the ion-assisted chemical etch rate in reactive plasmas

Journal of Applied Physics

Volumn 100, Issue 6, 2006, Pages

  Stafford, L ^a   Pearton, S J ^a   Margot, J ^b  

^a University of Florida   (United States)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ION ENERGY; REACTIVE NEUTRAL FLUXES; REACTIVE NEUTRAL SPECIES; SQUARE-ROOT ENERGY DEPENDENCE;

FLUORINE; HAFNIUM COMPOUNDS; MATHEMATICAL MODELS; REACTIVE ION ETCHING; SILICA; ZIRCONIA;

PLASMAS;

EID: 33749337573     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2349544     Document Type: Article

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