Investigation of the gas pressure influence on patterned platinum etching characteristics using a high-density plasma

Journal of Applied Physics

Volumn 89, Issue 1, 2001, Pages 29-33

  Delprat, S ^a   Chaker, M ^a   Margot, J ^b  

^a INRS EMT   (Canada)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002240927     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1330554     Document Type: Article

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