Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor deposition

Surface and Coatings Technology

Volumn 204, Issue 4, 2009, Pages 539-545

  Awad, Y ^a,b   El Khakani, M A ^c   Aktik, C ^a   Mouine, J ^a   Camire N ^b   Lessard, M ^b   Scarlete, M ^d   Al Abadleh, H A ^e   Smirani, R ^c  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

^b SiXtron Advanced Materials Inc   (Canada)

^c INSTITUT NATIONAL DE LA RECHERCHE SCIENTIFIQUE   (Canada)

^d BISHOP'S UNIVERSITY   (Canada)

^e WILFRID LAURIER UNIVERSITY   (Canada)

Author keywords

Coating; CVD; Silicon carbide; Silicon carbonitride; Thin films; Vapor transport deposition

Indexed keywords

AFM; ATOMIC COMPOSITIONS; C ATOMS; CHEMICAL BONDINGS; CVD; GAS-FLOW RATIO; H-BONDS; IN-SITU; MICROSTRUCTURAL LEVELS; N CONTENT; NANOINDENTATION TECHNIQUES; NITROGENATION; POLYDIMETHYLSILANE; SI-C BOND; SILICON CARBONITRIDE; SINGLE-SOURCE PRECURSOR; STRUCTURAL AND MECHANICAL PROPERTIES; YOUNG'S MODULUS;

AMORPHOUS SILICON; ARGON; ATOMIC SPECTROSCOPY; ATOMS; CARBON NITRIDE; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COATINGS; DEPOSITION; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; MECHANICAL PROPERTIES; PHOTORESISTS; POLYSILANES; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; SILICONES; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; THIN FILMS; TWO DIMENSIONAL; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 70349167968     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.08.032     Document Type: Article

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