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Surface and Coatings Technology

Volumn 197, Issue 2-3, 2005, Pages 154-160

The characterisation of e-beam evaporated and magnetron sputtered carbon films fabricated for atomic oxygen sensors

(3) Rao, J a Lawson, K J a Nicholls, J R a

a CRANFIELD UNIVERSITY (United Kingdom)

Author keywords

Carbon; Sputtering; Surface characterisation; Surface structure; Vapour growth

Indexed keywords

ALUMINA; ANNEALING; CARBON; CHARACTERIZATION; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; EVAPORATION; GRAPHITIZATION; HIGH TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; OXYGEN SENSORS; RAMAN SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC OXYGEN (AO); CARBON COATINGS; CARBON FILMS; HIGH-TEMPERATURE ANNEALING;

COATINGS;

COATING;

EID: 18844431913 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.06.044 Document Type: Article

Times cited : (29)

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