Structural, mechanical and tribological characterizations of a-C : HH : SSi films prepared by a hybrid PECVD and sputtering technique

Journal of Physics D: Applied Physics

Volumn 42, Issue 16, 2009, Pages

  Zhao, F ^a,b   Li, H X ^a   Ji, L ^a,b   Mo, Y F ^a,b   Quan, W L ^a,b   Zhou, H D ^a   Chen, J M ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION STRENGTHS; CHEMICAL STATE; CHEMICAL VAPOUR DEPOSITION; DLC FILM; GASEOUS PRECURSORS; HIGH SI CONTENT; INTERNAL STRESS; MOISTURE SENSITIVITY; OXIDIZATION; PEAK POSITION; RADIO FREQUENCY PLASMA; RAMAN SPECTRA; RF-PECVD; SI FILMS; SI-DOPING; SI-O-SI BOND; SI-SI BONDS; SPUTTERING TECHNIQUES; TRIBOLOGICAL CHARACTERIZATION; TRIBOLOGICAL PERFORMANCE; UNBALANCED MAGNETRON SPUTTERING;

ADHESION; ARGON; DOPING (ADDITIVES); FILM PREPARATION; INORGANIC COATINGS; MECHANICAL PROPERTIES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; STRESSES; TRIBOLOGY;

SILICON;

EID: 70349138918     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/16/165407     Document Type: Article

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