Characteristics of carbon films prepared by plasma-based ion implantation

Carbon

Volumn 42, Issue 2, 2004, Pages 387-393

  Liao, J X ^a   Liu, W M ^a   Xu, T ^a   Xue, Q J ^a  

^a LANZHOU INSTITUTE OF CHEMICAL PHYSICS   (China)

Author keywords

A. Carbon films; B. Implantation; C. X ray photoelectron spectroscopy; Diamond like carbon

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRIC POTENTIAL; ION BEAMS; ION IMPLANTATION; PLASMA APPLICATIONS; POSITIVE IONS; RAMAN SCATTERING; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON STRUCTURE; FILM HARDNESS;

DIAMOND LIKE CARBON FILMS;

EID: 0346339386     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2003.11.013     Document Type: Article

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