XPS and ellipsometric study of DLC/silicon interface

Vacuum

Volumn 61, Issue 2-4, 2001, Pages 269-273

  Zajickova L ^a   Veltruska K ^b   Tsud, N ^b   Franta, D ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

DLC films; Ellipsometry; Interface; XPS

Indexed keywords

ARGON; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM PREPARATION; METHANE; SILICON; SPUTTER DEPOSITION; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOM DISPLACEMENTS;

INTERFACES (MATERIALS);

EID: 0035858521     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00128-2     Document Type: Conference Paper

References (10)

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