Reactivity of halogenated resist polymer with low-energy electrons

Japanese Journal of Applied Physics

Volumn 48, Issue 6 PART 2, 2009, Pages

  Yamamoto, Hiroki ^a   Kozawa, Takahiro ^a   Saeki, Akinori ^a   Tagawa, Seiichi ^a   Mimura, Takeyoshi ^b   Yukawa, Hiroto ^b   Onodera, Junichi ^b  

^a OSAKA UNIVERSITY   (Japan)

^b TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACID GENERATION; ACID GENERATORS; AROMATIC RINGS; CHEMICALLY AMPLIFIED RESIST; DELOCALIZATIONS; EXCESS ELECTRONS; EXTREME ULTRAVIOLET RADIATIONS; HALOGENATED POLYMERS; LOW ENERGY ELECTRONS; POLY(4-HYDROXYSTYRENE); RADICAL ANIONS; RESIST POLYMERS; SECONDARY ELECTRONS;

ACIDS; AROMATIC POLYMERS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; FREE RADICAL POLYMERIZATION; HALOGENATION; IONIZING RADIATION; PHOTORESISTORS; PHOTORESISTS; POLYMERS; SECONDARY EMISSION; ULTRAVIOLET RADIATION;

ELECTRONS;

EID: 70249145081     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.06FC09     Document Type: Article

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