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Volumn 41, Issue 10, 2009, Pages 1872-1877

A two-dimensional analytical analysis of subthreshold behavior to study the scaling capability of nanoscale graded channel gate stack DG MOSFETs

Author keywords

GCGS DG MOSFET; Nanoscale MOSFETs; Short channel effects; Subthreshold behavior

Indexed keywords

ANALYTICAL ANALYSIS; ANALYTICAL MODEL; CRITICAL PROBLEMS; DG MOSFETS; DIBL EFFECTS; DOUBLE GATE MOSFET; GCGS DG MOSFET; GRADED CHANNELS; NANO SCALE; NANOSCALE MOSFETS; NANOSCALE REGIME; NUMERICAL SIMULATION; POTENTIAL BARRIERS; SCALING CAPABILITY; SHORT-CHANNEL EFFECT; SHORT-CHANNEL-EFFECTS; SUB-THRESHOLD CURRENT; SUBTHRESHOLD; SUBTHRESHOLD BEHAVIOR; SUBTHRESHOLD SWING; THRESHOLD VOLTAGE ROLL-OFF;

EID: 70249104536     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2009.08.002     Document Type: Article
Times cited : (64)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.