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Volumn 41, Issue 10, 2009, Pages 1872-1877
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A two-dimensional analytical analysis of subthreshold behavior to study the scaling capability of nanoscale graded channel gate stack DG MOSFETs
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Author keywords
GCGS DG MOSFET; Nanoscale MOSFETs; Short channel effects; Subthreshold behavior
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Indexed keywords
ANALYTICAL ANALYSIS;
ANALYTICAL MODEL;
CRITICAL PROBLEMS;
DG MOSFETS;
DIBL EFFECTS;
DOUBLE GATE MOSFET;
GCGS DG MOSFET;
GRADED CHANNELS;
NANO SCALE;
NANOSCALE MOSFETS;
NANOSCALE REGIME;
NUMERICAL SIMULATION;
POTENTIAL BARRIERS;
SCALING CAPABILITY;
SHORT-CHANNEL EFFECT;
SHORT-CHANNEL-EFFECTS;
SUB-THRESHOLD CURRENT;
SUBTHRESHOLD;
SUBTHRESHOLD BEHAVIOR;
SUBTHRESHOLD SWING;
THRESHOLD VOLTAGE ROLL-OFF;
GALERKIN METHODS;
LOGIC GATES;
NANOSTRUCTURED MATERIALS;
TWO DIMENSIONAL;
MOSFET DEVICES;
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EID: 70249104536
PISSN: 13869477
EISSN: None
Source Type: Journal
DOI: 10.1016/j.physe.2009.08.002 Document Type: Article |
Times cited : (64)
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References (14)
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